Company Profile

Guangdong KDW Intelligent Equipment Co.,Ltd. since its establishment in 2018, has focused on and committed to the physical and chemical cleaning process in the field of semiconductors and pan-semiconductors, and the cleaning medium covers organic matter, metal ions, particulate matter, oxides and other pollution sources, involving electronic assembly and semiconductor integrated circuit front and rear processes, mainly using DHF, SC1, SC2, O3, Nano spray, DIW and other cleaning technologies.

 Adhering to the core business philosophy of "friendliness, professionalism and integrity", the R&D team of KDW has completed the mass production of wet cleaning technology wet bench cleaning and etching, single wafer cleaning and etching, and its applicable processes cover Scrubber, Stripper, Solvent Clean, Metal Etching, Pre-Clean, Film Etching, Wafer Thinning, Backside Clean, Metal Lift-off, Wafer Reclaim, etc., for 6, 8 and 12 inch wafer sizes, suitable for Silicon, SiC, GaN, GaAs materials.

KDW always adheres to the value concept of "customer-centric,process-precipitated, and innovation-driven", fully utilizing the three combination models of "research and application, materials and process, technology and equipment", focusing on the development and exploration of wet process solutions, and committed to serving customers in the semiconductor industry.