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Process TechnologySemiconductor Wafer Fabrication ProcessCleaning Process in FABWet EtchingPhotoresist Stripping and Cleaning
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Single Wafer Backside EtcherBench CleaningSingle PR RemoveSingle Wafer Etcher
The SR300-F05 is a photoresist and polymer removal device for 6-inch, 8-inch and 12-inch wafers. The SR300-F05 offers customizable tank configurations, including 1 to 2 immersion tanks, 1 to 4 high-pressure flushing chambers, and 1 to 4 wash-dry chambers to meet different production needs. The multi-stage filter mechanism design makes maintenance easier, and high-end accessories such as the DICO2 configuration and CDS concentration meter are available to further enhance the functionality and flexibility of the equipment. Good temperature, concentration, pressure and flow control enable the SR300-F05 to maintain excellent performance in a variety of complex processes.
Address: 101 & 201, East Unit; 102 & 202, West Unit, Building 8, Phase I, Block V, Hengtai IMP, Suzhou Nano City, No. 75 Pudian Road, Suzhou Industrial Park
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