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Single PR Remove

The SR300-F05 is a photoresist and polymer removal device for 6-inch, 8-inch and 12-inch wafers. The SR300-F05 offers customizable tank configurations, including 1 to 2 immersion tanks, 1 to 4 high-pressure flushing chambers, and 1 to 4 wash-dry chambers to meet different production needs. The multi-stage filter mechanism design makes maintenance easier, and high-end accessories such as the DICO2 configuration and CDS concentration meter are available to further enhance the functionality and flexibility of the equipment. Good temperature, concentration, pressure and flow control enable the SR300-F05 to maintain excellent performance in a variety of complex processes.

Product Description

Model	SR300-F05
Size Wafer	6 "/8"/12"
process application	Wafer Photoresistive and Polymer Removal
Process indicators	Breakage rate	≤ 1/20000
	UPTIME	≥95%
	Particle	≤ 20@0.2um
software control	PC PLC configuration, support E84,GEM/SECS,EAP,FDC and other functions
Configuration	One to two soaking tanks (customizable)
	One to four high-pressure Jet processing chambers (customizable)
	One to four Rinsing and drying chambers (customizable)
	The multi-grade filter mechanism is designed for easy maintenance
	Configured with DICO2 function(Option)
	CDS, concentration meter(Option)
	Good control function on temperature, concentration, pressure and liquid flow

Jiangsu KDW Technology Co.,LTD.

粤ICP备2024271198号-1

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Address: 101 & 201, East Unit; 102 & 202, West Unit, Building 8, Phase I, Block V, Hengtai IMP, Suzhou Nano City, No. 75 Pudian Road, Suzhou Industrial Park

Tel: +86-0512-62998986

E-mail: sales@kdwtech.cn

Guangdong KDW Intelligent Equipment Co.,Ltd.

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