+
  • 3(1718886180188).jpg

Bench RCA Cleaning

BC200-A06 is a multi-functional equipment for 6" and 8" wafers, covering RCA cleaning, PR STRIP, dielectric film etching, metal etching, organic cleaning and wafer regeneration. Its excellent process indicators include very low fragmentation rate (≤1/100,000), high reliability (UPTIME ≥95%), and excellent particle control (Particle≤20@0.16um). Optional high-end accessories such as cassette exchanger and CDS concentration meter, as well as good temperature, concentration, pressure and flow control functions, make the BC200-A06 maintain excellent performance in various complex processes.

Product Description

Model

BC200-A06

Size Wafer

6 "/8"

process application

wafer RCA cleaning, PR STRIP, dielectric film etching, metal etching, organic cleaning, wafer regeneration

Process indicators

Breakage rate

≤ 1/100000

UPTIME

≥95%

Particle

≤ 20@0.16um

software control

PC PLC configuration, support GEM/SECS,EAP,FDC and other functions

Configuration

6 process tanks (4-14 tanks can be customized)

Advanced IPA Drying Unit

Multiple transfer arms and isolation Shuttles improve efficiency and prevent cross-contamination

Cassette exchange mechanism(option)

CDS, concentration meter(option)

Good control function on temperature, concentration, pressure and liquid flow

Perfect safety protection mechanism, including anti-collision, water leakage and automatic fire protection system