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Single Wafer Backside EtcherBench CleaningSingle PR RemoveSingle Wafer Etcher
Single Wafer Backside Etcher
Product Description
Model |
SC200-B02 |
|
Size Wafer |
Dimensions |
6 "/8" |
Wafer thickness |
≥ 100um |
|
Warpage |
≤ 6mm |
|
process application |
Wafer backside etching and cleaning |
|
Process indicators |
Breakage rate |
≤ 1/10000 |
UPTIME |
≥95% |
|
software control |
PC PLC configuration, support GEM/SECS,EAP,FDC and other functions |
|
Configuration |
2 process chambers (expandable to 4-8 chambers) |
|
2 load ports |
||
Breakage rateRobot and spin chuck with Bernoulli Fork |
||
Can be configured with 2-6 chemicals |
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CDS, concentration meter(option) |
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Good control function on temperature, concentration, pressure and liquid flow |
Guangdong KDW Intelligent Equipment Co.,Ltd.
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Address: 3rd Floor, Building A1, No. 38 Jingfu East Road, Yangwu Village, Dalang Town, Dongguan City



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