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Single Wafer Backside Etcher

The SC200-B02 is efficient, intelligent and accurate. It is capable of cleaning and etching the backside of 6- to 8-inch wafers, demonstrating great versatility. The PC+PLC control system ensures the intelligence and stability of the operation, supports a variety of industry standard protocols, and is easily integrated into the modern production line. The application of Bernoulli Fork manipulator has improved the accuracy and efficiency to a new level, and the whole process of contactless operation protects the wafer intact. Coupled with excellent temperature, concentration, pressure and flow control, this machine is undoubtedly the ideal choice to improve production efficiency and ensure product quality.

Product Description

Model

SC200-B02

Size Wafer

Dimensions

 6 "/8"

Wafer thickness

≥ 100um

Warpage

≤ 6mm

process application

Wafer backside etching and cleaning

Process indicators

Breakage rate

≤ 1/10000

UPTIME

≥95%

software control

PC PLC configuration, support GEM/SECS,EAP,FDC and other functions

Configuration

2 process chambers (expandable to 4-8 chambers)

2 load ports

Breakage rateRobot and spin chuck with Bernoulli Fork

Can be configured with 2-6 chemicals 

CDS, concentration meter(option)

Good control function on temperature, concentration, pressure and liquid flow